Microfabrication of Si by KOH Etchant Using Etching Mask Amorphized by Ar Ion Beam
نویسندگان
چکیده
منابع مشابه
Si nanopatterning by reactive ion etching through an on-chip self-assembled porous anodic alumina mask
We report on Si nanopatterning through an on-chip self-assembled porous anodic alumina (PAA) masking layer using reactive ion etching based on fluorine chemistry. Three different gases/gas mixtures were investigated: pure SF6, SF6/O2, and SF6/CHF3. For the first time, a systematic investigation of the etch rate and process anisotropy was performed. It was found that in all cases, the etch rate ...
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ژورنال
عنوان ژورنال: Sensors and Materials
سال: 2022
ISSN: ['0914-4935', '2435-0869']
DOI: https://doi.org/10.18494/sam3747